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| Name：WillieSor | 17, Sep, 2025 12:24:23 | |
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with an electron beam evaporator and provision for an electron bombardment substrate heater is described for use in the fabrication of thin film display devices. A clean environment at pressures down to 10(^ 8) torr is provided by sorption and sputter ion pumps. The apparatus includes electronic equ | |
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